Deposition of high-resolution carbon/carbon multilayers on large areas for X-ray optical applications

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1039-1042

  Menzel, M ^a   Weissbach D ^a   Gawlitza, P ^a   Dietsch, R ^b   Leson, A ^a  

^a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

^b AXO Dresden GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ATOMIC FORCE MICROSCOPY; CHEMICAL LASERS; COMPUTER SIMULATION; PARAMETER ESTIMATION; PULSED LASER DEPOSITION; REFLECTION; SURFACE ROUGHNESS; THICKNESS CONTROL; TRANSMISSION ELECTRON MICROSCOPY; X RAY ANALYSIS;

CARBON SINGLE LAYERS; HOMOGENEITY; X-RAY BEAMS; X-RAY OPTICAL MULTILAYERS;

OPTICAL MULTILAYERS;

EID: 4344601197     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2623-5     Document Type: Conference Paper

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