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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 1439-1443

Evidence by spectroscopic ellipsometry of optical property change in pulsed laser deposited NiO films when heated in air at Neel temperature

(7) Dahoo, P R a Hamon, T a Negulescu, B a Rocher, P a Tessier, M a Wack, A a Thomas, L a

a Centre National de la Recherche Scientifique (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSTS; DEPOSITION; ELLIPSOMETRY; FUNCTIONS; LIGHT POLARIZATION; MAGNETIC PROPERTIES; NICKEL COMPOUNDS; OPTICAL PROPERTIES; QUARTZ; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; ULTRAHIGH VACUUM;

NEEL TEMPERATURE; NICKEL OXIDE; SPECTROSCOPIC ELLIPSOMETRY (SE); ULTRA HIGH VACUUM (UHV) PROCESS CHAMBER;

PULSED LASER DEPOSITION;

EID: 4344583993 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2806-8 Document Type: Conference Paper

Times cited : (11)

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