In situ size measurement of Si nanoparticles and formation dynamics after laser ablation

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 4-6, 2004, Pages 819-821

  Makimura, T ^a   Mizuta, T ^a   Takahashi, T ^a   Murakami, K ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ARGON; DEFECTS; DEMODULATION; LASER ABLATION; PARAMETER ESTIMATION; PHOTOLUMINESCENCE; PHOTONS; SILICON COMPOUNDS;

EXCITATION LIGHT; FORMATION DYNAMICS; PHOTON ENERGY; PULSED LASER ABLATION;

NANOSTRUCTURED MATERIALS;

EID: 4344568147     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2798-4     Document Type: Conference Paper

References (13)

1. J. Muramoto, Y. Nakata, T. Okada, M. Maeda: Jpn. J. Appl. Phys. 36, L563 (1997)
2. J. Muramoto, Y. Nakata, T. Okada, M. Maeda: Appl. Surf. Sci. 127-129, 373 (1998)
3. T. Okada, J. Muramoto, Y. Nakata, M. Maeda: Extended Abstracts of the 4th NIMC International Symposium on Photoreaction Control and Photofunctional Materials, p. 74, Tsukuba 2001
4. D.B. Geohegan, A.A. Puretzky, G. Dusher, S.J. Pennycook: Appl. Phys. Lett. 72, 2987 (1998)
5. D.B. Geohegan, A.A. Puretzky, G. Dusher, S.J. Pennycook: Appl. Phys. Lett. 73, 438 (1998)
6. T. Makimura, T. Mizuta, K. Murakami: Appl. Phys. Lett. 76, 1401 (2000)
7. T. Makimura, T. Mizuta, K. Murakami: Appl. Phys. A 69, 213 (1999)
8. T. Makimura, T. Mizuta, K. Murakami: Jpn. J. Appl. Phys. 41, L144 (2002)
9. T. Mizuta, D. Takeuchi, T. Makimura, K. Murakami: Jpn. J. Appl. Phys. 41, 5739 (2002)
10. T. Ifuku, M. Otobe, A. Itoh, S. Oda: Jpn. J. Appl. Phys. 36, 4031 (1997)
11. C. Li, K. Kondo, T. Makimura, K. Murakami: Jpn. J. Appl. Phys. 42, 3424 (2003)
12. M. Ben-Chorin, B. Averboukh, D. Kovalev, G. Polisski, F. Koch: Phys. Rev. Lett. 77, 763 (1996)
13. Y. Kanemitsu: Optical Properties of Low-Dimensional Materials, ed. by T. Ogawa, Y. Kanemitsu (World Scientific, Singapore 1995) Chapt. 5