Increase of 1.5 μm luminescence from cryogenic temperature to room temperature from Er-doped SiO2 films with Si nanocrystallites fabricated by laser ablation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 A, 2003, Pages 3424-3428

  Li, Changqing ^a   Kondo, Keiichi ^a   Makimura, Tetsuya ^a   Murakami, Kouichi ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

1.5 m light emission; Energy transfer; Erbium; Laser ablation; Photoluminescence; Silicon nanocrystallites

Indexed keywords

ANNEALING; CRYSTAL GROWTH; ENERGY TRANSFER; ERBIUM; LIGHT EMISSION; LUMINESCENCE; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; SEMICONDUCTOR DOPING; SILICA; THERMAL EFFECTS;

CRYOGENIC TEMPERATURE; POWER DENSITY; SILICON NANOCRYSTALLITES;

LASER ABLATION;

EID: 0042381806     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3424     Document Type: Article

References (29)

1. S. Coffa, G. Franzò, F. Priolo, A. Polman and R. Serna: Phys. Rev. B 49 (1994) 16313.
2. H. Przybylinska, W. Jantsch, Yu. Suprun-Belevithch, M. Stepikhova, L. Palmetshofer, G. Hendorfer, A. Kozanecki, R. J. Wilson and B. J. Sealy: Phys. Rev. B 54 (1996) 2532.
3. F. Priolo, G. Franzò, S. Coffa, A. Polman, S. Libertino, R. Barklie and D. Carey: J. Appl. Phys. 78 (1995) 3874.
4. J. Palm, F. Gan, B. Zheng, J. Michel and L. C. Kimerling: Phys. Rev. B 54 (1996) 17603.
5. T. Kimura, A. Yokoi, H. Horiguchi, R. Saito, T. Ikoma and A. Sato: Appl. Phys. Lett. 65 (1994) 983.
6. X. Wu, U. Hömmerich, F. Namavar and A. M. C. Costa: Appl. Phys. Lett. 69 (1996) 1903.
7. W. Henley, Y. Kashka, J. Lagowski and J. Siejka: J. Appl. Phys. 87 (2000) 7848.
8. S. Komuro, S. Maruyama, T. Morikawa, X. W. Zhao, H. Isshiki and Y. Aoyagi: Appl. Phys. Lett. 69 (1996) 3896.
9. G. Franzò, D. Pacifici, V. Vinciguerra, F. Priolo and F. Iacona: Appl. Phys. Lett. 76 (2000) 2167.
10. M. Fujii, M. Yoshida, S. Hayashi and K. Yamamoto: J. Appl. Phys. 84 (1998) 4525.
11. X. W. Zhao, H. Isshiki, Y. Aoyagi, T. Sugano and S. Komuro: Mater. Sci. Eng. B 74 (2000) 197.
12. S. Seo and J. H. Shin: Appl. Phys. Lett. 75 (1999) 4070.
13. K. Watanabe, M. Fujii and S. Hayashi: J. Appl. Phys. 90 (2001) 4761.
14. D. Kovalev, J. Diener, H. Heckler, G. Polisski, N. Künzner and F. Koch: Phys. Rev. B 61 (2000) 4485.
15. W. J. Miniscalco. J. Lightwave Technol. 9 (1991) 234.
16. Y. Kanemitsu, T. Ogawa, K. Shiraishi and K. Takeda: Phys. Rev. B 48 (1993) 4883.
17. S. Miyazaki, A. Mouraguchi and K. Shiba: Thin Solid Films 297 (1997) 183.
18. M. L. Brongersma, P. G. Kik, A. Polman, K. S. Min and H. A. Atwater: Appl. Phys. Lett. 76 (2000) 351.
19. D. Kovalev, H. Heckler, G. Polisski and F. Koch: Phys. Status Solidi B 215 (1999) 871.
20. T. Makimura, Y. Kunii and K. Marakami: Jpn. J. Appl. Phys. 35 (1996) 4780.
21. K. Murakami, T. Suzuki, T. Makimura and M. Tamura: Appl. Phys. A 69 (1999) S13.
22. M. Shimizu, M. Yamada, M. Horiguchi and E. Sugita: IEEE Photon. Technol. Lett. 2 (1990) 43.
23. D. J. Eaglesham, J. Michel, E. A. Fitzgerald, D. C. Jacobson, J. M. Poate, J. L. Benton, A. Polman, Y. H. Xie and L. C. Kimerling: Appl. Phys. Lett. 58 (1991) 2797.
24. H. Hiura, T. Miyazaki and T. Kanayama: Phys. Rev. Lett. 86 (2001) 1733.
25. T. Makimura, T. Mizuta and K. Murakami: Ext. Abst. 3rd NIMC Int. Symp. on Photoreaction Control and Photofunctional Material, Tsukuba, 2000 (COE Office, NIMC, Tsukuba, 2000) p. 148.
26. X. L. Wu, Y. F. Mei, G. G. Siu, K. L. Wong, K. Moulding, M. J. Stokes, C. L. Fu and X. M. Bao: Phys. Rev. Lett. 86 (2001) 3000.
27. B. R. Judd: Phys. Rev. 127 (1962) 750.
28. G. S. Ofelt: J. Chem. Phys. 37 (1962) 511.
29. M. Ishii, T. Ishikawa, T. Ueki, S. Komuro, T. Morikawa, Y. Aoyagi and H. Oyanagi: J. Appl. Phys. 85 (1999) 4024.