Inspecting alternating phase shift masks by matching stepper conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 247-252

  Rosenbusch, Anja ^b   Hemar, Shirley ^a   Kenan, Boaz ^a  

^a Applied Materials Inc Israel   (Israel)

^b NONE   (United States)

Author keywords

193nm technology; AAPSM; Aerial image based mask inspection; At wavelength inspection; OPC

Indexed keywords

ETCHING; IMAGING SYSTEMS; INSPECTION; PHASE SHIFT;

AERIAL IMAGING;

MASKS;

EID: 0037627739     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467781     Document Type: Conference Paper

References (4)

1. K. Ozawa, T. Komizo, K. Kikuchi, H. Ohnuma, H. Kawahira, "Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment", SPIE 4691, pp. 1009-1020, 2002
2. L. S. Zurbrick, J. P. Heumann, M. W. Rudzinski, S. E. Stokowski, J. Urbach, L. Wang, "New approaches to alternating phase-shift mask inspection", SPIE 4562, pp. 138-144, 2002
3. V. Philipsen, R. M. Jonkheere, S. Kohlpoth, A. Torres, "Defect printability for 100-nm design rule using 193nm lithography", SPIE 4754, pp. 639-650, 2002
4. L. Karklin, M. M. Altamirano, L. Cai, K. A. Phan, C. Spence, "Automatic defect severity scoring for 193-nm reticle defect inspection", SPIE 4346, pp. 898-906, 2001