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Volumn 2, Issue , 2007, Pages 613-616

Multiple deposition of Ga-doped ZnO thin films on COP substrate for the fabrication of transparent conductive films

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; GALLIUM COMPOUNDS; OLEFINS; ZINC OXIDE;

EID: 43349107703     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (7)
  • 3
    • 33749545716 scopus 로고    scopus 로고
    • Optimization of transparent conducting ZnO films deposited on PVC substrate by PLD method
    • Information and Systems, pp
    • T. Maeda, H. Agura, T. Aoki, A. Suzuki, T. Matsushita, M. Okuda, "Optimization of transparent conducting ZnO films deposited on PVC substrate by PLD method", IEE J Transactions on Electronics, Information and Systems, pp.132-133, Vol. 126 (2006)
    • (2006) IEE J Transactions on Electronics , vol.126 , pp. 132-133
    • Maeda, T.1    Agura, H.2    Aoki, T.3    Suzuki, A.4    Matsushita, T.5    Okuda, M.6
  • 4
    • 30344434995 scopus 로고    scopus 로고
    • Transparent conductive ZnO:Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering
    • Z.L. Pei, X.B. Zhang, G.P. Zhang, J. Gong, C. Sun, R.F. Huang, L.S. Wen, "Transparent conductive ZnO:Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering", Thin Solid Films, pp. 20-23, Vol. 497, (2006)
    • (2006) Thin Solid Films , vol.497 , pp. 20-23
    • Pei, Z.L.1    Zhang, X.B.2    Zhang, G.P.3    Gong, J.4    Sun, C.5    Huang, R.F.6    Wen, L.S.7
  • 5
    • 0033716385 scopus 로고    scopus 로고
    • Preparation of trasparet conducting ZnO:AI films on polymer substrate by r.f. magnetron sputtering
    • D. H. Zhang, T. L. Yang, J. Ma, Q.P. Wang, R.W.Gao, H.L.Ma, "Preparation of trasparet conducting ZnO:AI films on polymer substrate by r.f. magnetron sputtering", Appl. Surf. Sci., pp. 43-48, vol. 158 (2000)
    • (2000) Appl. Surf. Sci , vol.158 , pp. 43-48
    • Zhang, D.H.1    Yang, T.L.2    Ma, J.3    Wang, Q.P.4    Gao, R.W.5    Ma, H.L.6
  • 6
    • 0034943750 scopus 로고    scopus 로고
    • Application of the Ion Plating Process Utilized High Stable Plasma to the Deposition Technology
    • M. Tanaka, H. Makino, R. Chikugo, T. Sakemi and K. Awai, "Application of the Ion Plating Process Utilized High Stable Plasma to the Deposition Technology", J. Vac. Soc. Jpn., pp. 435-439, Vol. 44 (2001)
    • (2001) J. Vac. Soc. Jpn , vol.44 , pp. 435-439
    • Tanaka, M.1    Makino, H.2    Chikugo, R.3    Sakemi, T.4    Awai, K.5
  • 7
    • 34547689095 scopus 로고    scopus 로고
    • Low-resistivity Ga-doped ZnO thin films of less than 100 nm thickness prepared by ion plating with direct current arc discharge
    • T. Yamada, A. Miyake, S. Kishimoto, H. Makino, N. Yamamoto and T. Yamamoto, "Low-resistivity Ga-doped ZnO thin films of less than 100 nm thickness prepared by ion plating with direct current arc discharge", Appl. Phys. Lett. 91 (2007) 051915.
    • (2007) Appl. Phys. Lett , vol.91 , pp. 051915
    • Yamada, T.1    Miyake, A.2    Kishimoto, S.3    Makino, H.4    Yamamoto, N.5    Yamamoto, T.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.