Power scaling of an extreme ultraviolet light source for future lithography

Applied Physics Letters

Volumn 92, Issue 18, 2008, Pages

  Wagenaars, Erik ^a,d   Küpper, Felix ^b   Klein, Jürgen ^b   Neff, Willi ^b   Damen, Marcel ^c   Van Der Wel, Pieter ^c   Vaudrevange, Dominik ^c   Jonkers, Jeroen ^c  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^c PHILIPS RESEARCH LABORATORIES   (Germany)

^d UNIVERSITY OF YORK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; POWER CONTROL; SCALABILITY; WAVELENGTH;

HIGH VOLUME MANUFACTURING; OPTIMAL WORKING POINTS; POWER SCALING; PULSE ENERGY;

LIGHT SOURCES;

EID: 43349105239     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2924299     Document Type: Article

References (6)

1. G. Moore, Electronics 38, 114 (1965).
2. M. van den Brink, Proceedings of the ASML Investor Day, London, UK, 2007 (unpublished) see http://www.asml.com/asml/show.do?ctx=32938.
3. J. Jonkers, Plasma Sources Sci. Technol. 15, S8 (2006).
4. N. Harned, M. Goethals, R. Groeneveld, P. Kuerz, M. Lowisch, H. Meijer, H. Meiling, K. Ronse, J. Ryan, M. Tittnich, H.-J. Voorma, J. Zimmerman, U. Mickan, and S. Lok, Proc. SPIE 6517, 651705 (2007).
5. T. Miura, K. Murakami, K. Suzuki, Y. Kohama, K. Morita, K. Hada, and Y. Ohkubo, Proc. SPIE 6517, 651707 (2007).
6. J. Pankert, R. Apetz, K. Bergmann, M. Damen, G. Derra, O. Franken, M. Janssen, J. Jonkers, J. Klein, H. Kraus, T. Kruecken, A. List, M. Loeken, A. Mader, C. Metzmacher, W. Neff, S. Probst, R. Pruemmer, O. Rosier, S. Schwabe, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen, Proc. SPIE 6151, 61510Q (2006).