Production of high-density capacitive plasma by the effects of multihollow cathode discharge and high-secondary-electron emission

Applied Physics Letters

Volumn 92, Issue 17, 2008, Pages

  Ohtsu, Y ^a   Fujita, H ^a  

^a SAGA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; PLASMA DENSITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY EMISSION; THIN FILMS;

AMORPHOUS HYDROCARBON; CATHODE ELECTRODE; MULTIHOLLOW CATHODE DISCHARGE;

PLASMAS;

EID: 43049149012     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2917795     Document Type: Article

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