Electron field emission properties on UNCD coated Si-nanowires

Diamond and Related Materials

Volumn 17, Issue 4-5, 2008, Pages 753-757

  Tzeng, Yu Fen ^a   Lee, Yen Chih ^a   Lee, Chi Young ^a   Chiu, Hsin Tien ^b   Lin, I Nan ^c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c TAMKANG UNIVERSITY   (Taiwan)

Author keywords

Electron field emission (EFE); Silicon nanowires (SiNWs); Ultra nano crystalline diamond (UNCD)

Indexed keywords

CARBON NANOTUBES; DEPOSITION; ELECTROLESS PLATING; FIELD EMISSION; GRANULATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ELECTROLESS METAL DEPOSITION; SILICON NANOWIRES; TIME INTERVAL; ULTRA-NANO-CRYSTALLINE DIAMONDS;

NANOWIRES;

EID: 43049142651     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2007.10.014     Document Type: Article

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