The influences of electrodeposited temperature on the morphology and magnetic properties of Fe/Fe-dimethylsulfoxide nanocables

Electrochimica Acta

Volumn 53, Issue 16, 2008, Pages 5464-5468

  Fu, Junli ^a   Gao, Daqiang ^a   Xu, Yan ^a   Xue, Desheng ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Dimethylsulfoxide; Electrodeposited temperature; Magnetic properties; Morphology; Nanocable

Indexed keywords

ALUMINA; ANISOTROPY; COERCIVE FORCE; COORDINATION REACTIONS; DIMETHYL SULFOXIDE; ELECTRODEPOSITION; MORPHOLOGY; TRANSMISSION ELECTRON MICROSCOPY;

COORDINATION COMPOUNDS; ELECTRODEPOSITED TEMPERATURE; NANOCABLE; TRANSMISSION ELECTRON MICROSCOPE;

CABLES;

EID: 43049141921     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2008.02.102     Document Type: Article

References (33)

1. Lauhon L.J., Gudiksen M.S., Wang D., and Lieber C.M. Nature 420 (2002) 57
2. Choi H.J., Johnson J.C., He R., Lee S.K., Kim F., Pauzauskie P., Goldberg J., Saykally R.J., and Yang P.D. J. Phys. Chem. B 107 (2003) 8721
3. Hofmann S., Ducati C., and Robertson J. Adv. Mater. 14 (2002) 1821
4. Wirtz M., and Martin C.R. Adv. Mater. 15 (2003) 455
5. Shinohara H. Prog. Rep. Phys. 63 (2000) 843
6. Wudl F.J. J. Mater. Chem. 12 (2002) 1959
7. Li C.J., Guo Y.G., Li B.S., Wang C.R., Wan L.J., and Bai C.L. Adv. Mater. 17 (2005) 71
8. Cao J., Sun J.Z., Hong J., Li H.Y., Chen H.Z., and Wang M. Adv. Mater. 16 (2004) 84
9. Li Y.B., Dorozhkin P.S., Bando Y.S., and Golberg D. Adv. Mater. 17 (2005) 545
10. Duan R.G., and Mukherjee A.K. Adv. Mater. 16 (2004) 1106
11. Han W.Q., Kohler-Redlich P., Scheu C., Ernst F., Rühle M., Grobert N., Terrones M., Kroto H.W., and Walton D.R.M. Adv. Mater. 12 (2000) 1356
12. Fullam S., Cottell D., Rensmo H., and Fitzmaurice D. Adv. Mater. 12 (2000) 1430
13. Daly B., Arnold D.C., Kulkarni J.S., Kazakova O., Shaw M.T., Nikitenko S., Erts D., Morris M.A., and Holmes J.D. Small 2 (2006) 1299
14. Li L., Yang Y.W., Li G.H., and Zhang L.D. Small 2 (2006) 548
15. Gunawidjaja R., Jiang C.Y., Peleshanko S., Ornatska M., Singamaneni S., and Tsukruk V.V. Adv. Funct. Mater. 16 (2006) 2024
16. Martin C.R. Science 266 (1994) 1961
17. Routkevitch D., Tager A.A., Haruyama J., Almawlawi D., Moskovits M., and Xu J.M. IEEE Trans. Electron Devices 43 (1996) 1646
18. Hulteen J.C., and Martin C.R. J. Mater. Chem. 7 (1997) 1075
19. Yuan D.S., and Liu Y.L. Mater. Chem. Phys. 96 (2006) 79
20. Li G.R., Tong Y.X., Wang Y., and Liu G.K. Electrochim. Acta. 48 (2003) 4061
21. Li G.R., Tong Y.X., and Liu G.K. Mater. Lett. 58 (2004) 3839
22. Tan S.Z., Yuan D.S., and Liu Y.L. Mater. Lett. 60 (2006) 2055
23. Yin A.J., Li J., Jian W., Bennett A.J., and Xu J.M. Appl. Phys. Lett. 79 (2001) 1039
24. Trau M., Yao N., Kim E., Xia Y., Whitesides G.M., and Aksay I.A. Nature 390 (1997) 674
25. Fendler J.H. Chem. Mater. 8 (1996) 1616
26. Cao H.Q., Xu Z., Sang H., Sheng D., and Tie C.Y. Adv. Mater. 13 (2001) 121
27. Zhang J.X., Shi G.Q., Liu C., Qu L.T., Fu M.X., and Chen F.E. J. Mater. Sci. 38 (2003) 2423
28. Fu M., Zhu Y., Tan R., and Shi G. Adv. Mater. 13 (2001) 1874
29. Kim Y.J., and Song J.H. Bull. Korean Chem. Soc. 26 (2005) 227
30. Masuda H., and Fukuda K. Science 268 (1995) 1466
31. Peng Y., Zhang H.L., Pan S.L., and Li H.L. J. Appl. Phys. 87 (2000) 7405
32. Bao J.C., Xu Z., Hong J.M., Ma X., and Lu Z.H. Scripta Mater. 50 (2004) 19
33. Prabhakaran C.P., and Patel C.C. J. Inorg. Nucl. Chem. 32 (1970) 1223