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Volumn 354, Issue 19-25, 2008, Pages 2483-2487
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Correlation between micro-roughness, surface chemistry, and performance of crystalline Si/amorphous Si:H:Cl hetero-junction solar cells
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Author keywords
Amorphous semiconductors; Chemical vapor deposition; Devices; Diffraction and scattering measurements; Films and coatings; FTIR measurements; Heterojunctions; Microcrystallinity; Microstructure; Optical properties; Photovoltaics; Plasma deposition; Silicon; Solar cells; X ray diffraction
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Indexed keywords
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HETEROJUNCTIONS;
MEASUREMENT THEORY;
MICROSTRUCTURE;
OPTICAL PROPERTIES;
PHOTOVOLTAIC CELLS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
SOLAR CELLS;
X RAY DIFFRACTION ANALYSIS;
FTIR MEASUREMENTS;
MICROCRYSTALLINITY;
SCATTERING MEASUREMENTS;
AMORPHOUS SEMICONDUCTORS;
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EID: 42649136552
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2007.10.065 Document Type: Article |
Times cited : (4)
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References (10)
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