Optical and structural characteristics of ion-plated Nb2O5 and HfO2 films

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Hallbauer, Antje ^a   Huber, Daniel ^a   Klauser, Frederik ^a   Kunz, Andrea ^a   Tessadri, Richard ^a   Kaiser, Ute ^a   Yulin, Sergiy ^a   Pulker, Hans K ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

Author keywords

Ion plating; Optical properties; Oxides; Structural properties; Structure; Thin films

Indexed keywords

ARC CURRENT; BULK MATERIALS; DIELECTRIC THIN FILMS; FILM DENSITY; FILM STRUCTURE; FINE GRAINED; FLAT FILMS; GLASS SUBSTRATES; HIGH OXYGEN PARTIAL PRESSURE; ION PLATING; OPTICAL ABSORPTION COEFFICIENTS; POLYCRYSTALLINE; REACTIVE LOW VOLTAGE ION PLATINGS; STRUCTURAL CHARACTERISTICS; STRUCTURE; TEM ANALYSIS; XRD;

AMORPHOUS FILMS; HAFNIUM COMPOUNDS; ION IMPLANTATION; NIOBIUM; OXYGEN; PLATING; REFRACTIVE INDEX; THIN FILMS;

STRUCTURAL PROPERTIES;

EID: 42649121529     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730402     Document Type: Conference Paper

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