Influence of boron doping on roughness microcrystalline silicon

Journal of Non-Crystalline Solids

Volumn 354, Issue 19-25, 2008, Pages 2204-2207

  Toyama, T ^a   Yoshida, W ^a   Sobajima, Y ^a   Okamoto, H ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Atomic force and scanning tunneling microscopy; Crystal growth; Nucleation; Plasma deposition

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON; CRYSTAL GROWTH; DOPING (ADDITIVES); NUCLEATION; PLASMA DEPOSITION; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS;

BORON CONCENTRATION; BORON DOPING; CATALYTIC EFFECTS; SURFACE-COVERING LAYER;

MICROCRYSTALLINE SILICON;

EID: 42649097877     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2007.10.052     Document Type: Article

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