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Volumn 993, Issue , 2008, Pages 379-382

Applications of laser plasma EUV source based on a gas puff target

Author keywords

EUV; Gas puff target; Laser plasma; Luminescence

Indexed keywords


EID: 42449152761     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2909153     Document Type: Conference Paper
Times cited : (2)

References (13)
  • 7
    • 0000305092 scopus 로고    scopus 로고
    • P. Jaegle et al., J. Appl. Phys. 81, 2406-2409 (1997)
    • (1997) J. Appl. Phys , vol.81 , pp. 2406-2409
    • Jaegle, P.1
  • 12
    • 42449108324 scopus 로고    scopus 로고
    • A. Bartnik et al, in Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, Libor Juha; Ryszard H. Sobierajski; Hubertus Wabnitz, Editors, 65 860A
    • A. Bartnik et al, in Proc. SPIE vol. 6586, Damage to VUV, EUV, and X-ray Optics, Libor Juha; Ryszard H. Sobierajski; Hubertus Wabnitz, Editors, 65 860A


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.