Interface strain in thermal Si/SiO2 analysed by frequency-dependent electron spin resonance

Physica B: Condensed Matter

Volumn 308-310, Issue , 2001, Pages 481-484

  Pierreux, Dieter ^a   Stesmans, André ^a  

^a UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Defect; ESR; Si SiO2 interface; Strain

Indexed keywords

CRYSTAL DEFECTS; INTERFACES (MATERIALS); PARAMAGNETIC RESONANCE; SILICA; STRAIN; THERMOOXIDATION;

INTERFACIAL STRAIN;

SEMICONDUCTING SILICON;

EID: 4243592056     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(01)00749-9     Document Type: Article

References (14)