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Volumn 59, Issue 2, 2008, Pages 81-85

Comparison of a standard and a Schottky dual gate mosfet

Author keywords

MOSFET; Schottky dual gate

Indexed keywords


EID: 42249084082     PISSN: 13353632     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (2)

References (6)
  • 1
    • 26244446788 scopus 로고    scopus 로고
    • MASAHARA, M. - LIU, Y. - SAKAMOTO, K. - ENDO, K. -MATSUKAWA, Y. - ISHII, K. - SEKIGAWA, T. - YAMAUCHI, H. - TANOUE, H. - KANEMARU, S. - KOIKE, H. - SUZUKI, E.: Demonstration, Analysis, and Device Design Considerations for Independent DG MOSFETs, IEEE Transactions on Electron Devices 52 (2005), 2046.
    • MASAHARA, M. - LIU, Y. - SAKAMOTO, K. - ENDO, K. -MATSUKAWA, Y. - ISHII, K. - SEKIGAWA, T. - YAMAUCHI, H. - TANOUE, H. - KANEMARU, S. - KOIKE, H. - SUZUKI, E.: Demonstration, Analysis, and Device Design Considerations for Independent DG MOSFETs, IEEE Transactions on Electron Devices 52 (2005), 2046.
  • 2
    • 42249085824 scopus 로고    scopus 로고
    • ISE TCAD Release 10, 4a, DESSIS.
    • ISE TCAD Release 10, Volume 4a, DESSIS.
  • 3
    • 0025454713 scopus 로고
    • Modeling the Tunneling Current in Reverse-Biased p/n Junctions
    • LIOU, J. J.: Modeling the Tunneling Current in Reverse-Biased p/n Junctions, Solid-State Electronics 33 (1990page 971).
    • (1990) Solid-State Electronics , vol.33 , pp. 971
    • LIOU, J.J.1
  • 4
    • 23944491953 scopus 로고    scopus 로고
    • Influence of Image and Exchange-Correlation Effects on Electron Transport in Nanoscale DG MOSFETs
    • IWATA, H. - MATSUDA, T. - OHZONE, T.: Influence of Image and Exchange-Correlation Effects on Electron Transport in Nanoscale DG MOSFETs, IEEE Transactions on Electron Devices 52 (2005), 1596.
    • (2005) IEEE Transactions on Electron Devices , vol.52 , pp. 1596
    • IWATA, H.1    MATSUDA, T.2    OHZONE, T.3
  • 5
    • 42249102813 scopus 로고    scopus 로고
    • http://www.ee.buffalo.edu/faculty/cartwright/java_applets/ quantum/numerov/index.html-Quantum-Electronic: Numerov Quantum Well Calculator.
    • Quantum, N.1    Calculator, W.2
  • 6
    • 18744368540 scopus 로고    scopus 로고
    • ZHAO, Q. T. - BREUER, U. - RIJE, E. - LENK, S. - MANTL, S. Tuning of NiSi/Si Schottky Barrier Heights by Sulfur Segregation During Ni Silicidation : Applied Physics Letters 86 (2005), paper 062108.
    • ZHAO, Q. T. - BREUER, U. - RIJE, E. - LENK, S. - MANTL, S. Tuning of NiSi/Si Schottky Barrier Heights by Sulfur Segregation During Ni Silicidation : Applied Physics Letters 86 (2005), paper 062108.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.