Optical near-field patterning of photopolymer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6647, Issue , 2007, Pages

  Soppera, Olivier ^a   Jradi, Safi ^a   Ecoffet, Carole ^a   Lougnot, Daniel J ^a  

^a UNIVERSITÉ DE HAUTE ALSACE   (France)

Author keywords

Evanescent waves; Nanofabrication; Optical near field; Photolithography; Photopolymer

Indexed keywords

ATOMIC FORCE MICROSCOPY; CROSSLINKING; DIFFRACTION GRATINGS; LIGHT REFLECTION; NANOTECHNOLOGY; PHOTOLITHOGRAPHY;

EVANESCENT WAVES; OPTICAL NEAR-FIELD PATTERNING; PHOTOPOLYMER MATERIALS; TOTAL INTERNAL REFLECTION;

PHOTOPOLYMERS;

EID: 42149160300     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.732416     Document Type: Conference Paper

References (12)

1. C. M. Sotomayor Torres, Alternative Lithography: Unleasing Potentials of Nanotechnology; Nanostructure Science and Technology; Kluwer Academic/Plenum Publishers, New York (2003)
2. C Wagner, W. Kaiser, J. Mulkens, Proc. SPIE, 4000, 344-357 (2000)
3. Y. Inao, S. Nakasato, R. Kuroda, M. Ohtsu, Microelectronic Engineering, 84, 705-710 (2007)
4. A. Espanet, G. Dos santos, C. Ecoffet, D.J. Lougnot, Applied Surface Science, 87, 138-139 (1999)
5. H. Ibn El Ahrach, R. Bachelot, A. Vial, G. Lerondel, J. Plain, P. Royer, O. Soppera, Physical Review Letters, 98, 107402 (2007)
6. H'dhili F, Bachelot R, Lerondel G, Barchiesi D, Royer, P. Appl Phys Lett, 79(24), 4019-21 (2001)
7. A.A. Tseng, Optics & Laser Technology, 39, 514-526 (2007)
8. K. Stetson, Applied Physics Letters, 11, 225 (1967)
9. A. Espanet, C. Ecoffet, D. J. Lougnot, Journal of Polymer Science: Part A: polymer Chemistry, Vol. 37, (1999) 2075
10. D.J. Lougnot, C Turck, Pure Appl. Opt, 1, 251 (1992)
11. S. Sainov, A. Espanet, C. Ecoffet, D.J. Lougnot, J. Opt A : Pure Appl. Opt, 5, 142-146 (2003).
12. O. Soppera, S. Jradi, C. Carré, D. J. Lougnot, Proc. SPIE Photonics Europe, Optical Micro- and Nanometrology in Microsystems Technology, 6188, 60-68 (2006)