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Journal of Applied Physics

Volumn 103, Issue 7, 2008, Pages

Residual stresses in the elastoplastic multilayer thin film structures: The cases of Si/Al bilayer and Si/Al/ SiO2 trilayer structures

(3) Zhang, X C a,b Xu, B S c Xuan, F Z b

a Shanghai Jiao Tong University (China)

b EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

c NATIONAL KEY LABORATORY FOR REMANUFACTURING (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOPLASTICITY; MATHEMATICAL MODELS; SILICON COMPOUNDS;

BILAYER STRUCTURES; ELASTOPLASTIC MULTILAYER THIN FILM STRUCTURES; TRILAYER STRUCTURES;

MULTILAYERS;

EID: 42149159443 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2832751 Document Type: Article

Times cited : (12)

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