Annealing temperature dependence of C60 on silicon surfaces: Bond evolution and fragmentation as detected by NEXAFS

Physica Scripta T

Volumn T115, Issue , 2005, Pages 695-698

  Pedio, M ^a   Borgatti, F ^a   Giglia, A ^a   Mahne, N ^a   Nannarone, S ^b   Giovannini, S ^c   Cepek, C ^a   Magnano, E ^a   Bertoni, G ^d   Spiller, E ^d   Sancrotti, M ^a,d   Giovanelli, L ^a   Floreano, L ^a   Gotter, R ^a   Morgante, A ^a,e  

^a LABORATORIO TASC   (Italy)

^b UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

^c UNIVERSITY OF BOLOGNA   (Italy)

^d INFM   (Italy)

^e UNIVERSITY OF TRIESTE   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FULLERENE FRAGMENTATION; SUBSTRATE INTERACTION;

ANNEALING; FULLERENES; NUCLEATION; POLARIZATION;

X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY;

EID: 42149103179     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1238/Physica.Topical.115a00695     Document Type: Article

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