Aspect ratios, sizes, and etch rates in photostructurable glass-ceramic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6882, Issue , 2008, Pages

  Stillman, J ^a,b   Judy, J ^b   Helvajian, H ^a  

^a AEROSPACE CORPORATION   (United States)

^b University of California   (United States)

Author keywords

3 D; Aspect ratio; Foturan; PSGC

Indexed keywords

ASPECT RATIO; ETCHING; MICROOPTICS; PHOTOSENSITIVE GLASS;

ETCH RATES; FOTURAN SAMPLES; LASER-PATTERNING; PHOTOSTRUCTURABLE GLASS-CERAMICS (PSGC);

CERAMIC MATERIALS;

EID: 41149162109     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.761895     Document Type: Conference Paper

References (13)

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