N-K electron energy-loss near-edge structures for TiN/VN layers: An ab initio and experimental study

Analytical and Bioanalytical Chemistry

Volumn 390, Issue 6, 2008, Pages 1447-1453

  Lazar, Petr ^a   Redinger, Josef ^a   Strobl, Johannes ^a   Podloucky, Raimund ^b   Rashkova, Boriana ^c   Dehm, Gerhard ^c   Kothleitner, Gerald ^d   Šturm, Sašo ^e   Kutschej, Kerstin ^c   Mitterer, Christian ^c   Scheu, Christina ^c  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITY OF VIENNA   (Austria)

^c UNIVERSITY OF LEOBEN   (Austria)

^d GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^e JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Interface surface analysis; Spectroscopy theory; Thin films

Indexed keywords

DENSITY FUNCTIONAL THEORY; ELECTRONIC STRUCTURE; FILM GROWTH; INTERFACES (MATERIALS); MAGNESIA; TITANIUM NITRIDE; VANADIUM COMPOUNDS;

ELECTRON ENERGY LOSS NEAR-EDGE STRUCTURES; INTERFACE/SURFACE ANALYSIS;

THIN FILMS;

EID: 41149095105     PISSN: 16182642     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/s00216-007-1759-0     Document Type: Article

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