-
1
-
-
79956011470
-
-
APPLAB 0003-6951 10.1063/1.1473234.
-
L. Ma, J. Liu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1473234 80, 2997 (2002).
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 2997
-
-
Ma, L.1
Liu, J.2
Yang, Y.3
-
2
-
-
0037416568
-
-
APPLAB 0003-6951 10.1063/1.1556555.
-
L. Ma, S. Pyo, J. Ouyang, Q. Xu, and Y. Yang, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1556555 82, 1419 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 1419
-
-
Ma, L.1
Pyo, S.2
Ouyang, J.3
Xu, Q.4
Yang, Y.5
-
3
-
-
0344515287
-
-
JAPIAU 0021-8979 10.1063/1.1622990.
-
A. Kiesow, J. E. Morris, C. Radehaus, and A. Heilmann, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1622990 94, 6988 (2003).
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 6988
-
-
Kiesow, A.1
Morris, J.E.2
Radehaus, C.3
Heilmann, A.4
-
4
-
-
1242352420
-
-
APPLAB 0003-6951 10.1063/1.1643547.
-
L. D. Bozano, B. W. Kean, V. R. Deline, J. R. Salem, and J. C. Scott, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1643547 84, 607 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 607
-
-
Bozano, L.D.1
Kean, B.W.2
Deline, V.R.3
Salem, J.R.4
Scott, J.C.5
-
5
-
-
12844249479
-
-
APPLAB 0003-6951 10.1063/1.1829166.
-
D. Tondelier, K. Lmimouni, D. Vuillaume, C. Fery, and G. Haas, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1829166 85, 5763 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 5763
-
-
Tondelier, D.1
Lmimouni, K.2
Vuillaume, D.3
Fery, C.4
Haas, G.5
-
6
-
-
33744485608
-
-
AFMDC6 1616-301X 10.1002/adfm.200500429.
-
Y. Yang, J. Ouyang, L. Ma, R. J.-H. Tseng, and C.-W. Chu, Adv. Funct. Mater. AFMDC6 1616-301X 10.1002/adfm.200500429 16, 1001 (2006).
-
(2006)
Adv. Funct. Mater.
, vol.16
, pp. 1001
-
-
Yang, Y.1
Ouyang, J.2
Ma, L.3
Tseng, R.J.-H.4
Chu, C.-W.5
-
8
-
-
20444491554
-
-
JAPIAU 0021-8979 10.1063/1.1866496.
-
J. He, J. Wu, and Y. Yang, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1866496 97, 064507 (2005).
-
(2005)
J. Appl. Phys.
, vol.97
, pp. 064507
-
-
He, J.1
Wu, J.2
Yang, Y.3
-
9
-
-
33748801714
-
-
OERLAU 1566-1199 10.1016/j.orgel.2006.03.014.
-
M. Cölle, M. Büchel, and D. M. De Leeuw, Org. Electron. OERLAU 1566-1199 10.1016/j.orgel.2006.03.014 7, 305 (2006).
-
(2006)
Org. Electron.
, vol.7
, pp. 305
-
-
Cölle, M.1
Büchel, M.2
De Leeuw, D.M.3
-
10
-
-
34548853416
-
-
OERLAU 1566-1199.
-
F. L. E. Jakobsson, X. Crispin, M. Cölle, M. Büchel, D. M. De Leeuw, and M. Berggren, Org. Electron. OERLAU 1566-1199 8, 559 (2007).
-
(2007)
Org. Electron.
, vol.8
, pp. 559
-
-
Jakobsson, F.L.E.1
Crispin, X.2
Cölle, M.3
Büchel, M.4
De Leeuw, D.M.5
Berggren, M.6
-
11
-
-
0033751124
-
-
LANGD5 0743-7463 10.1021/la991356v.
-
H. X. He, D. Zhang, Q. G. Li, T. Zhu, S. F. Y. Li, and Z. F. Liu, Langmuir LANGD5 0743-7463 10.1021/la991356v 16, 3846 (2000).
-
(2000)
Langmuir
, vol.16
, pp. 3846
-
-
He, H.X.1
Zhang, D.2
Li, Q.G.3
Zhu, T.4
Li, S.F.Y.5
Liu, Z.F.6
-
12
-
-
0031192626
-
-
JAPIAU 0021-8979 10.1063/1.365600.
-
T. Sato, H. Ahmed, D. Brown, and B. F. G. Johnson, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.365600 82, 696 (1997).
-
(1997)
J. Appl. Phys.
, vol.82
, pp. 696
-
-
Sato, T.1
Ahmed, H.2
Brown, D.3
Johnson, B.F.G.4
-
14
-
-
0032638844
-
-
LANGD5 0743-7463 10.1021/la981379u.
-
D. F. Siqueira Petri, G. Wenz, P. Schunk, and T. Schimmel, Langmuir LANGD5 0743-7463 10.1021/la981379u 15, 4520 (1999).
-
(1999)
Langmuir
, vol.15
, pp. 4520
-
-
Siqueira Petri, D.F.1
Wenz, G.2
Schunk, P.3
Schimmel, T.4
-
15
-
-
28844494018
-
-
APPLAB 0003-6951 10.1063/1.2146059.
-
G. Gu, M. G. Kane, J. E. Doty, and A. H. Firester, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2146059 87, 243512 (2005).
-
(2005)
Appl. Phys. Lett.
, vol.87
, pp. 243512
-
-
Gu, G.1
Kane, M.G.2
Doty, J.E.3
Firester, A.H.4
-
16
-
-
33846567589
-
-
APPLAB 0003-6951 10.1063/1.2435598.
-
W. L. Leong, P. S. Lee, S. G. Mhaisalkar, T. P. Chen, and A. Dodabalapur, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2435598 90, 042906 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 042906
-
-
Leong, W.L.1
Lee, P.S.2
Mhaisalkar, S.G.3
Chen, T.P.4
Dodabalapur, A.5
-
17
-
-
2342639588
-
-
NMAACR 1476-1122 10.1038/nmat1105.
-
S. Kobayashi, T. Nishikawa, T. Takenobu, S. Mori, T. Shimoda, T. Mitani, H. Shimotani, N. Yoshimoto, S. Ogawa, and Y. Iwasa, Nat. Mater. NMAACR 1476-1122 10.1038/nmat1105 3, 317 (2004).
-
(2004)
Nat. Mater.
, vol.3
, pp. 317
-
-
Kobayashi, S.1
Nishikawa, T.2
Takenobu, T.3
Mori, S.4
Shimoda, T.5
Mitani, T.6
Shimotani, H.7
Yoshimoto, N.8
Ogawa, S.9
Iwasa, Y.10
-
18
-
-
40849086285
-
-
MOS (Metal Oxide Semiconductor) Physics and Technology (Wiley, New York).
-
E. H. Nicollian and J. R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology (Wiley, New York, 1982).
-
(1982)
-
-
Nicollian, E.H.1
Brews, J.R.2
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