Measurement of the IR absorption induced by visible radiation in amorphous silicon and silicon carbide thin films by an in-guide technique

Optical Materials

Volumn 30, Issue 8, 2008, Pages 1240-1243

  Nigro, Maria Arcangela ^a   Gagliardi, Massimo ^a   Corte, Francesco Giuseppe Della ^a  

^a UNIVERSITY MEDITERRANEA OF REGGIO CALABRIA   (Italy)

Author keywords

Amorphous silicon; Infrared absorption; Photoinduced absorption; Silicon photonics; Thin film waveguides

Indexed keywords

INFRARED ABSORPTION; PLANAR WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; THIN FILMS;

PHOTOINDUCED ABSORPTION; SILICON PHOTONICS; THIN FILM WAVEGUIDES; VISIBLE RADIATION;

AMORPHOUS SILICON;

EID: 40849116249     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2007.06.002     Document Type: Article

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