Preventing kinetic roughening in physical vapor-phase-deposited films

Physical Review Letters

Volumn 100, Issue 1, 2008, Pages

  Vasco, E ^a   Polop, C ^b   Sacedon J L ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^b UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

GROWTH KINETICS; MOLECULAR BEAM EPITAXY; PHYSICAL VAPOR DEPOSITION; SPUTTERING; ULTRATHIN FILMS;

HYPERTHERMAL SPECIES; OSTWALD RIPENING MECHANISM;

KINETIC ENERGY;

EID: 40749101079     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.100.016102     Document Type: Article

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