Ion-implanted silicon X-ray calorimeters: Present and future

Journal of Low Temperature Physics

Volumn 151, Issue 1-2 PART 1, 2008, Pages 375-380

  Kelley, Richard L ^a   Allen, C A ^a   Galeazzi, M ^b   Kilbourne, C A ^a   McCammon, D ^c   Porter, F S ^a   Szymkowiak, A E ^d  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

^b UNIVERSITY OF MIAMI   (United States)

^c University of Wisconsin ^*  (United States)

^d Yale University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASTROPHYSICS; ATOMIC PHYSICS; ION IMPLANTATION; JUNCTION GATE FIELD EFFECT TRANSISTORS; THERMAL CONDUCTIVITY;

X-RAY CALORIMETERS;

CALORIMETERS;

EID: 40649089591     PISSN: 00222291     EISSN: 15737357     Source Type: Journal    
DOI: 10.1007/s10909-007-9663-8     Document Type: Article

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