Photoluminescence studies of implantation damage centers in30Si

Journal of Applied Physics

Volumn 96, Issue 3, 2004, Pages 1754-1756

  Hayama, S ^a   Davies, G ^a   Itoh, K M ^b  

^a KING'S COLLEGE LONDON   (United Kingdom)

^b KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; CRYSTALS; FOURIER TRANSFORMS; IMPURITIES; ION BEAMS; ION IMPLANTATION; ISOTOPES; NEUTRONS; PHONONS; PHOSPHORUS; PHOTOLUMINESCENCE; SEMICONDUCTOR DEVICES;

IMPLANTATION DAMAGES; LATTICE ISOTOPES; PHOTOLUMINESCENCE (PL) SPECTRA; ZERO-PHONON LINES;

SILICON;

EID: 4043133210     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1767965     Document Type: Article

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