Photocrosslinking system based on poly(vinyl phenol) and fluorene derivatives with epoxy unit using photoacid and photobase generators

Journal of Photopolymer Science and Technology

Volumn 14, Issue 2, 2001, Pages 159-162

  Okamura, Haruyuki ^a,b   Harada, Chika ^a,b   Morishita, Satoshi ^a   Shirai, Masamitsu ^a   Tsunooka, Masahiro ^a   Fujiki, Tsuyosi ^a   Kawasaki, Shin Ichi ^b   Yamada, Mitsuaki ^b  

^a Osaka Prefecture University   (Japan)

^b OSAKA GAS CO LTD   (Japan)

Author keywords

Epoxide; Fluorene; Photoacid generator(photobase generator; Photocrosslinking; Poly(vinyl phenol)

Indexed keywords

ACID; EPOXIDE; FLUORENE DERIVATIVE; POLY(VINYL PHENOL); POLYMER; UNCLASSIFIED DRUG;

ARTICLE; CROSS LINKING; DECOMPOSITION; GENERATOR; PHOTOCHEMISTRY; REFRACTION INDEX; SOLUBILIZATION; THERMOSTABILITY;

EID: 0035746897     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.14.159     Document Type: Article

References (5)