Convection-assisted chemical vapor deposition (CoCVD) of silicon on large-area substrates

Journal of Crystal Growth

Volumn 310, Issue 6, 2008, Pages 1112-1117

  Kunz, T ^a   Burkert, I ^a   Auer, R ^a   Lovtsus, A A ^b   Talalaev, R A ^b   Makarov, Yu N ^b  

^a BAVARIAN CENTER FOR APPLIED ENERGY RESEARCH ZAE BAYERN   (Germany)

^b Semiconductor Technology Research GmbH   (Germany)

Author keywords

A1. Computer simulation; A1. Convection; A1. Fluid flows; A3. Vapor phase epitaxy; B2. Semiconducting silicon; B3. Solar cells

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FLOW OF GASES; HEAT CONVECTION; SOLAR CELLS; TEMPERATURE DISTRIBUTION; VAPOR PHASE EPITAXY;

CONVECTION-ASSISTED CHEMICAL VAPOR DEPOSITION (COCVD); GROWTH RATES; SUBSTRATE MOVEMENT;

SEMICONDUCTING SILICON;

EID: 39649099766     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.12.027     Document Type: Article

References (14)

1. Ghandhi S.K. VLSI Fabrication Principles: Silicon and Gallium Arsenide (1994), Wiley, New York p. 298
2. In: O'Mara W.C., Herring R.B., and Hunt L.P. (Eds). Handbook of Semiconductor Silicon Technology, Polysilicon Preparation (1990), Noyes Publications, NJ 33
3. Brendel R. Thin-Film Crystalline Silicon Solar Cells (2003), Wiley-VCH, Weinheim p. 91
4. Takatsuka H., Yamauchi Y., Kawamura K., Mashima H., and Takeuchi Y. Thin Solid Films 506-507 (2006) 13
5. Segal A.S., Galyukov A.O., Kondratyev A.V., Sid'ko A.P., Yu. Karpov S., Makarov Yu.N., Siebert W., and Storck P. Microelectron. Eng. 56 (2001) 93
6. A. Hurrle, S. Reber, N. Schillinger, J. Haase, J.G. Reichart, High-throughput continous CVD reactor for silicon deposition, in: Proceedings of the 19th European PVSEC, Paris, 2004, p. 459.
7. DeAnna R.G., Fleischman A.J., Zorman C.A., and Mehregany M. J. Chem. Vapor Deposition 6 (1998) 280
8. Rainova Yu.P., Antonenko K.I., Pezoldt J., Schenk A., and Eichhorn G. Symp. Mater. Res. Soc. (1998) 403
9. Angermeier D., Monna R., Slaoui A., and Muller J.C. J. Electrochem. Soc. 144 (1997) 3256
10. 2 substrate for photovoltaics, in: Proceedings of the 19th European PVSEC, Paris, 2004, p. 1241.
11. 2) by convection-assisted chemical vapor deposition (CoCVD), in: Proceedings of the 15th PVSEC, Shanghai, 2005, p. 190.
12. 2) grown by convection-assisted chemical vapor deposition, in: Proceedings of the 4th WCPEC, Hawaii, 2006, p. 1620.
13. V. Gazuz, M. Mühlbauer, M. Scheffler, R. Weissmann, R. Auer, Rapid thermal processing of solar cells by Si wafer bonding on low cost substrates, in: Proceedings of the 21st EU PVSEC, Dresden, 2006, p. 851.
14. Segal A.S., Galyukov A.O., Kondrat'yev A.V., Sid'ko A.P., Karpov S.Yu., Makarov Yu.N., Siebert W., Storck P., and Lowry S.A. Electrochem. Soc. Proc. 13 (2000) 456