Device technology for embedded DRAM utilizing stacked MIM(Metal-insulator- metal) capacitor

Proceedings of the Custom Integrated Circuits Conference

Volumn , Issue , 2006, Pages 421-427

  Yamagata, Y ^a   Shirai, H ^a   Sugimura, H ^a   Arai, S ^a   Wake, T ^a   Inoue, K ^a   Sakoh, T ^a   Sakao, M ^a   Tanigawa, T ^a  

^a RENESAS TECHNOLOGY CORP   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CMOS INTEGRATED CIRCUITS; DIELECTRIC MATERIALS; GATE DIELECTRICS; MIM DEVICES;

DRAM SCALING; PARASITIC RESISTANCE;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 39049143813     PISSN: 08865930     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/CICC.2006.320987     Document Type: Conference Paper

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4. S. Arai et al., IEDM Tech. Dig., pp403-406, 2001
5. Y.Yasuda et al., IEDM Tech. Dig., pp73-76, 2005