Observation of strong magnetic anisotropy in zinc-blende CrTe thin films

Journal of Physics D: Applied Physics

Volumn 41, Issue 4, 2008, Pages

  Bi, J F ^b   Sreenivasan, M G ^b   Teo, K L ^a   Liew, T ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b DATA STORAGE INSTITUTE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; EPITAXIAL GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETIC ANISOTROPY; MOLECULAR BEAM EPITAXY; TELLURIUM COMPOUNDS; ZINC COMPOUNDS;

ANISOTROPY CONSTANTS; LOW TEMPERATURE MOLECULAR BEAM EPITAXY; MAGNETIZATION CURVES; TEMPERATURE DEPENDENT REMANENT MAGNETIZATION MEASUREMENT;

THIN FILMS;

EID: 38949193183     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/4/045002     Document Type: Article

References (30)

1. de Groot R A, Mueller F M, van Engen P G and Buschow K H J 1983 Phys. Rev. Lett. 50 2024
2. Yanase A and Siratori K 1984 J. Phys. Soc. Japan 53 312
3. Schwarz K 1986 J. Phys. F: Met. Phys. 16 L211
4. Pickett W E and Singh D J 1996 Phys. Rev. B 53 1146
5. Galanakis I 2002 Phys. Rev. B 66 012406
6. Galanakis I and Mavropoulos P 2003 Phys. Rev. B 67 104417
7. Pask J E, Yang L H, Fong C Y, Pickett W E and Dag S 2003 Phys. Rev. B 67 224420
8. Sanyal B, Bergqvist L and Eriksson O 2003 Phys. Rev. B 68 054417
9. Miao M S and Lambrecht W R L 2005 Phys. Rev. B 71 064407
10. Ono K, Okabayashi J, Mizuguchi M, Oshima M, Fujimori A and Akinaga H 2002 J. Appl. Phys. 91 8088
11. Akinaga H, Manago T and Shirai M 2000 Japan. J. Appl. Phys. 39 L1118
12. Etgens V H, de Camargo P C, Eddrief M, Mattana R, George J M and Garreau Y 2004 Phys. Rev. Lett. 92 167205
13. Bi J F, Zhao J H, Deng J J, Zheng Y H, Li S S, Wu X G and Jia Q J 2006 Appl. Phys. Lett. 88 142509
14. Zhao J H, Matsukura F, Takamura K, Abe E, Chiba D and Ohno H 2001 Appl. Phys. Lett. 79 2776
15. Deng J J, Zhao J H, Bi J F, Niu Z C, Yang F H and Zheng H Z 2006 J. Appl. Phys. 99 093902
16. Xie W H, Xu Y Q, Liu B G and Pettifor D G 2003 Phys. Rev. Lett. 91 037204
17. Zhao Y J and Zunger A 2005 Phys. Rev. B 71 132403
18. Sreenivasan M G, Teo K L, Jalil M B A, Liew T, Chong T C and Du A Y 2006 IEEE Trans. Magn. 42 2691
19. Sreenivasan M G, Hou X J, Teo K L, Jalil M B A, Liew T and Chong T C 2006 Thin Solid Films 505 133
20. Seifert W, Carlsson N, Miller M, Pistol M, Samuelson L and Wallenberg L R 1996 Prog. Cryst. Growth Charact. Mater. 33 423
21. Wang K Y, Sawicki M, Edmonds K W, Campion R P, Maat S, Foxon C T, Gallagher B L and Dietl T 2005 Phys. Rev. Lett. 95 217204
22. Welp U, Vlasko-Vlasov V K, Menzel A, You H D, Liu X, Furdyna J K and Wojtowicz T 2004 Appl. Phys. Lett. 85 260
23. Welp U, Vlasko-Vlasov V K, Liu X, Furdyna J K and Wojtowicz T 2003 Phys. Rev. Lett. 90 167206
24. Stanciu V and Svedlindh P 2005 Appl. Phys. Lett. 87 242509
25. Felser C, Fecher G H and Balke B 2007 Angew. Chem. Int. Edn 46 668
26. Chevreton M, Bertaut E F and Jellinek F 1963 Acta Crystallogr. 16 431
27. Ipser H, Komarek K L and Klepp K O 1983 J. Less-Common Met. 92 265
28. Dijkstra J, Weitering H H, van Bruggen C F, Haas C and de Groot R A 1989 J. Phys.: Condens. Matter 1 9141
29. Bensch W, Helmer O and Näther C 1997 Mater. Res. Bull. 32 305
30. Lukoschus K, Kraschinski S, Näther C, Bensch W and Kremer R K 2004 J. Solid State Chem. 177 951