Growth of CrTe thin films by molecular-beam epitaxy

Thin Solid Films

Volumn 505, Issue 1-2, 2006, Pages 133-136

  Sreenivasan, M G ^a,b   Hou, X J ^a,b   Teo, K L ^b   Jalil, M B A ^b   Liew, T ^a,b   Chong, T C ^a  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

CrTe; Ferromagnetic; Molecular beam epitaxy

Indexed keywords

CHROMIUM COMPOUNDS; FERROMAGNETIC MATERIALS; FILM GROWTH; MAGNETIZATION; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;

BUFFER LAYERS; CRTE; FILM THICKNESS; TEMPERATURE-DEPENDENT MAGNETIZATION;

THIN FILMS;

EID: 33644891626     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.10.027     Document Type: Article

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