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Volumn 11, Issue 2, 2002, Pages 242-248

Effect of WC grain growth inhibitors on the adhesion of chemical vapor deposition diamond films on WC-Co cemented carbide

(5) Polini, Riccardo a Bravi, Fabio a Mattei, Giorgio b Marcheselli, Giancarlo c Traversa, Enrico a

a UNIVERSITY OF ROME TOR VERGATA (Italy)

b CNR (Italy)

c Fabbrica Italiana Leghe Metalliche Sinterizzate (FILMS) SpA (Italy)

Author keywords

Adhesion; Diamond coated tools; Interface; Micro Raman spectroscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DOPING (ADDITIVES); GRAIN GROWTH; HYDROGEN PEROXIDE; SINTERING; SUBSTRATES;

INSERTS;

TUNGSTEN CARBIDE;

ADHESION; CHEMICAL VAPOR DEPOSITION; DIAMOND COATING; TOOL WEAR; TUNGSTEN CARBIDE; TUNGSTEN CARBIDE-COBALT ALLOY;

EID: 0036473072 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(01)00681-1 Document Type: Article

Times cited : (28)

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