Atomic oxygen densities in a downstream microwave O2/Ar plasma source

Plasma Sources Science and Technology

Volumn 16, Issue 4, 2007, Pages 798-802

  Ershov, Alexander ^a   Borysow, Jacek ^b  

^a CYMER INC   (United States)

^b MICHIGAN TECHNOLOGICAL UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); DENSITY (SPECIFIC GRAVITY); FLOW RATE; GLOW DISCHARGES; MICROWAVES; TITRATION;

DOWNSTREAM MICROWAVES; EMISSION RATIO; MICROWAVE DISCHARGE;

PLASMA SOURCES;

EID: 38849194865     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/16/4/015     Document Type: Article

References (19)

1. Brake M, Hinkle J, Asmussen J, Hawley M and Kerber R 1983 Plasma Chem. Plasma Process. 3 63
2. Piper L G and Rawlins W T 1986 J. Phys. Chem. 90 320
3. Coburn J W and Chen M 1980 J. Appl. Phys. 51 3134
4. Kaufman F 1958 Proc. R. Soc. Lond. A 247 123
5. Kaufman F 1958 J. Chem. Phys. 28 352
6. Breithbarth F W, Ducke E and Tiller H J 1990 Plasma Chem. Plasma Process. 10 377
7. Walkup R E, Saenger K L and Selwyn G S 1986 J. Chem. Phys. 84 2668
8. Collart E J H, Baggerman J A G and Visser R J 1991 J. Appl. Phys. 70 5278
9. Booth J P, Joubert O and Pelletier J 1991 J. Appl. Phys. 69 619
10. Granier A, Chereau D, Henda K, Safari R and Leprince P 1994 J. Appl. Phys. 75 104
11. Katsch H M, Tewes A, Quandt E, Goehlich A, Kawetzki T and Dobele F 2000 J. Appl. Phys. 88 6232
12. Macko P, Veis P and Cernogora G 2004 Plasma Sources Sci. Technol. 13 251
13. Toader E I 2004 Plasma Sources Sci. Technol. 13 646
14. Dagdigian P J, Forch B E and Miziolek A W 1988 Chem. Phys. Lett. 148 299
15. Sadeghi N, Setser D W, Francis A, Czarnetzki U and Dobele H F 2001 J. Chem. Phys. 115 3145
16. Brown M S, Ganguly B N and Garscadden A 2002 Plasma Sources Sci. Technol. 11 190
17. Kitajima T, Nakano T and Makabe T 2006 Appl. Phys. Lett. 88 091501
18. Rickey D and Krenos J 1997 J. Chem. Phys. 106 3135
19. Balamuta J and Golde M F 1982 J. Chem. Phys. 86 2765