Effects of thickness and electrolytes on the capacitive characteristics of anodically deposited hydrous manganese oxide coatings

Journal of Electroanalytical Chemistry

Volumn 613, Issue 2, 2008, Pages 125-130

  Wu, Mengqiang ^a   Zhang, Liping ^b   Gao, Jiahui ^a   Xiao, Chao ^a   Wang, Dongmei ^a   Chen, Ai ^a   Zhang, Shuren ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b SICHUAN UNIVERSITY OF SCIENCE AND ENGINEERING   (China)

Author keywords

Anodic deposition; Electrochemical capacitance; Electrolytes; MnO2 coatings; Thickness

Indexed keywords

CAPACITANCE; CYCLIC VOLTAMMETRY; ELECTRODEPOSITION; ELECTROLYTES; MANGANESE COMPOUNDS; METAL IONS;

ANODIC DEPOSITION; CHRONOPOTENTIOMETRY; DEPOSITION CHARGES; ELECTROCHEMICAL CAPACITANCE;

INORGANIC COATINGS;

EID: 38849194691     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2007.10.018     Document Type: Article

References (29)

1. Zheng J.P., Cygan P.J., and Jow T.R. J. Electrochem. Soc. 142 (1995) 2699
2. Liu T., Pell W.G., and Conway B.E. Electrochim. Acta 42 (1997) 3541
3. Liu K.C., and Anderson M.A. J. Electrochem. Soc. 143 (1996) 124
4. Srinivasan V., and Weidner J.W. J. Electrochem. Soc. 144 (1997) L210
5. Srinivasan V., and Weidner J.W. J. Electrochem. Soc. 147 (2000) 880
6. Grupioni A.A.F., and Lassali T.A.F. J. Electrochem. Soc. 148 (2001) A1015
7. Nam K.W., Yoon W.S., and Kim K.B. Electrochim. Acta 47 (2002) 3201
8. Kalu E.E., Nwoga T.T., Srinivasan V., and Weidner J.W. J. Power Sources 92 (2001) 163
9. Srinivasan V., and Weidner J.W. J. Power Sources 108 (2002) 15
10. Kim H.K., Seong T.Y., Lim J.H., Cho W.L., and Yoon Y.S. J. Power Sources 102 (2001) 167
11. Lin C., Ritter J.A., and Popov B.N. J. Electrochem. Soc. 145 (1998) 4097
12. Pang S.C., Anderson M.A., and Chapman T.W. J. Electrochem. Soc. 147 (2000) 444
13. Pang S.C., and Anderson M.A. J. Mater. Res. 15 (2000) 2096
14. Reddy R.N., and Reddy R.G. J. Power Sources 124 (2003) 330
15. Wu M., Snook G.A., Chen G.Z., and Fray D.J. Electrochem. Commun. 6 (2004) 499
16. Dong W., Sakamoto J., and Dunn B. J. Sol-Gel Sci. Technol. 26 (2003) 641
17. Dong W., Sakamoto J.S., and Dunn B. Sci. Technol. Adv. Mater. 4 (2003) 3
18. Wang S.-Y., and Wu N.-L. J. Appl. Electrochem. 33 (2003) 345
19. Lee H.Y., Kim S.W., and Lee H.Y. Electrochem. Solid State Lett. 4 (2001) A19
20. Hu C.C., and Tsou T.W. Electrochem. Commun. 4 (2002) 105
21. Hu C.C., and Tsou T.W. Electrochim. Acta 47 (2002) 3523
22. Chang J.K., and Tsai W.T. J. Electrochem. Soc. 150 (2003) A1333
23. Hu C.-C., and Wang C.-C. J. Electrochem. Soc. 150 (2003) A1079
24. Prasad K.R., and Miura N. J. Power Sources 135 (2004) 54
25. Wu M.-S. Appl. Phys. Lett. 87 (2005) 153102
26. Shinomiya T., Gupta V., and Miura N. Electrochim. Acta 51 (2006) 4412
27. Broughton J.N., and Brett M.J. Electrochim. Acta 50 (2005) 4814
28. Lee H.Y., and Goodenough J.B. J. Solid State Chem. 144 (1999) 220
29. Toupin M., Brousse T., and Belanger D. Chem. Mater. 16 (2004) 3184