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Volumn 475, Issue 1-2, 2008, Pages 17-19
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Diamond films produced by microwave plasma chemical vapor deposition at low temperature and their characterization
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Author keywords
Argon; Diamond films; Low temperature; MPCVD
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Indexed keywords
CHARACTERIZATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
MICROWAVES;
NUCLEATION;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;
SECONDARY NUCLEATION PARTICLES;
DIAMOND FILMS;
CHARACTERIZATION;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
DIAMOND FILMS;
MICROWAVES;
NUCLEATION;
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EID: 38749138176
PISSN: 09215093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.msea.2006.12.139 Document Type: Article |
Times cited : (10)
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References (10)
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