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Volumn 475, Issue 1-2, 2008, Pages 17-19

Diamond films produced by microwave plasma chemical vapor deposition at low temperature and their characterization

Author keywords

Argon; Diamond films; Low temperature; MPCVD

Indexed keywords

CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; MICROWAVES; NUCLEATION;

EID: 38749138176     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.msea.2006.12.139     Document Type: Article
Times cited : (10)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.