Effects of dielectric thickness and contact area on current-voltage characteristics of thin film metal-insulator-metal diodes

Thin Solid Films

Volumn 516, Issue 8, 2008, Pages 2244-2250

  Krishnan, Subramanian ^a   Stefanakos, Elias ^a   Bhansali, Shekhar ^a  

^a University of South Florida   (United States)

Author keywords

Current voltage characteristics; I V characteristics; MIM diode; Ni NiO Cr; Thin film dielectric; Tunnel diode

Indexed keywords

DIELECTRIC FILMS; METAL INSULATOR BOUNDARIES; THICKNESS MEASUREMENT; TUNNEL DIODES;

CURRENT-VOLTAGE CHARACTERISTICS; MIM DIODES; THIN FILM DIELECTRICS;

THIN FILMS;

EID: 38649143203     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.08.067     Document Type: Article

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