Surface ripple changes during Cr film ablation with a double ultrashort laser pulse

Optics and Lasers in Engineering

Volumn 46, Issue 4, 2008, Pages 306-310

  Kim, Jaegu ^a   Na, Suckjoo ^b   Cho, Sunghak ^a   Chang, Wonseok ^a   Whang, Kyunghyun ^a  

^a Korea Institute of Machine and Materials   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Double pulses; Ripples; Thin film ablation; Ultrashort laser

Indexed keywords

CHROMIUM COMPOUNDS; LASER ABLATION; MOLTEN MATERIALS; SURFACE TREATMENT; TIME DELAY; ULTRASHORT PULSES;

DOUBLE PULSES; NANOMETER-SIZED PARTICLES; SURFACE RIPPLES; THIN FILM ABLATION;

THIN FILMS;

EID: 38649117570     PISSN: 01438166     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlaseng.2007.12.003     Document Type: Article

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