X-ray characterization of the lattice perfection of heteroepitaxial SIS structures

Solid State Phenomena

Volumn 131-133, Issue , 2008, Pages 619-624

  Zaumseil, P ^a   Weidner, G ^a   Schroeder, T ^a  

^a IHP   (Germany)

Author keywords

Heteroepitaxy; High k material; Pole figure; SIS structure; TEM; XRD

Indexed keywords

CRYSTAL LATTICES; CRYSTAL ORIENTATION; STACKING FAULTS; SUBSTRATES; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; MOLECULAR ORIENTATION; POLES; PRASEODYMIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

CAP LAYERS; CRYSTALLOGRAPHIC STRUCTURE; LATTICE PERFECTION; X-RAY CHARACTERIZATION; HIGH-K MATERIALS; LATTICE ORIENTATIONS; POLE FIGURE; SI(111) SUBSTRATE; STACKING ORIENTATION; X-RAY POLE FIGURE MEASUREMENT;

EPITAXIAL GROWTH; SUBSTRATES;

EID: 38549171301     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

References (7)

1. nd Edition, Wiley - VCH, 2005).
2. P. Zaumseil, T. Schroeder and G. Weidner: Solid State Phenomena Vols. 108-109 (2005), p. 741
3. T. Schroeder, P. Zaumseil, G. Weidner, G. Lupina, Ch. Wenger, H.-J. Müssig and P. Storck: J. Appl. Phys. Vol. 98 (2005), p. 123513.
4. W. Kern: Handbook of Semiconductor Cleaning Technology (Noyes, 1993).
5. T. Schroeder, T.-L. Lee, L. Libralesso, I. Journard, J. Zegenhagen, P. Zaumseil, G. Lippert, J. Dabrowski and H.-J. Müssig: J. Appl. Phys. Vol. 97 (2005), p. 074906.
6. IHP XRD and XRR simulation software RCRefSimW.
7. T. Schroeder, P. Zaumseil, G. Weidner, Ch. Wenger, J. Dabrowski, H.-J. Müssig and P. Storck: J. Appl. Phys. Vol. 99 (2006), p. 014101.