The effect of porosity of metal zinc films on the formation of ZnO prepared by thermal oxidation

Materials Research Society Symposium Proceedings

Volumn 1012, Issue , 2007, Pages 139-143

  Chao, Liang Chiun ^a   Liau, Chung Chi ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; POROSITY; SURFACE MORPHOLOGY; THERMOOXIDATION; METALLIC FILMS; MORPHOLOGY; OPTICAL FILMS; OXIDATION; ZINC OXIDE;

CAPILLARITRON; HIGH POROSITY FILMS; METAL ZINC FILMS; OXIDATION TEMPERATURE; DC MAGNETRON SPUTTERING; ION-BEAM SPUTTERING; OPTIMUM PROCESSING TEMPERATURE; SEM MICROGRAPHS; THERMAL OXIDATION; ZINC PRECURSOR; ZNO THIN FILM;

METALLIC FILMS; FILM PREPARATION;

EID: 38549111117     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1012-y03-17     Document Type: Conference Paper

References (4)

1. S. Cho, J. Ma, Y. Kim, Y. Sun, G. K. L. Wong, and J. B. Ketterson, Appl. Phys. Lett. 75, 2761 (1999).
2. Y. G. Wang, S. P. Lau, H. W. Lee, S. F. Yu, and B. K. Tay, J. Appl. Phys. 94, 354 (2003).
3. X. L. Xu, S. P. Lau, and B. K. Tay, Thin Solid Films 398-399, 244 (2001).
4. J. F. Mahoney, J. Perel, and A. T. Forrester, Appl. Phys. Lett. 38, 320 (1981).