Reduction of interpore distance of anodized aluminum oxide nano pattern by mixed H3PO4:H2SO4 electrolyte

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 11, 2007, Pages 4206-4209

  Song, Kwang Min ^a   Park, Joonmo ^a   Ryu, Sang Wan ^a  

^a Chonnam National University   (South Korea)

Author keywords

Anodization; Anodized aluminum oxide; Nano pattern

Indexed keywords

ALUMINA; ELECTROLYTES; NANOSTRUCTURES; SEMICONDUCTOR QUANTUM DOTS;

ANODIZATIONS; ANODIZED ALUMINUM OXIDE; COMMERCIAL APPLICATIONS; HIGH-DENSITY QUANTUM; INTERPORE DISTANCES; NANO PATTERN; QUANTUM CONFINEMENT EFFECTS; SCIENTIFIC RESEARCHES;

ALUMINUM OXIDE;

ALUMINUM OXIDE; ELECTROLYTE; NANOMATERIAL; PHOSPHORIC ACID; SULFURIC ACID;

ARTICLE; CHEMISTRY; CONFORMATION; CRYSTALLIZATION; ELECTRODE; MACROMOLECULE; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; PARTICLE SIZE; POROSITY; SURFACE PROPERTY; ULTRASTRUCTURE;

ALUMINUM OXIDE; CRYSTALLIZATION; ELECTRODES; ELECTROLYTES; MACROMOLECULAR SUBSTANCES; MATERIALS TESTING; MOLECULAR CONFORMATION; NANOSTRUCTURES; NANOTECHNOLOGY; PARTICLE SIZE; PHOSPHORIC ACIDS; POROSITY; SULFURIC ACIDS; SURFACE PROPERTIES;

EID: 38449123416     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (16)

1. J. Li, C. Papadopoulos, and J. M. Xu, Appl. Phys. Lett. 75, 367 (1999).
2. W. B. Choi, B. H. Cheong, J. J. Kim, J. Chu, and E. Bae, Adv. Funct.. Mater. 13, 80 (2003).
3. C. L. Xu, H. Li, T. Xue, and H. L. Li, Scripta Mater. 54, 1605 (2006).
4. H. Hu and D. He, Mater. Lett. 60, 1019 (2006).
5. D. Crouse, Y. Lo, A. E. Miller, and M. Crouse, Appl. Phys. Lett. 76, 49 (2000).
6. O. Jessensky, F. Müller, and U. Gösele, J. Electrochem. Sac. 145, 3735 (1998).
7. O. Jessensky, F. Müller, and U. Gösele, Appl. Phys. Lett. 72, 1173 (1998).
8. F. Li, L. Zhang, and R. M. Metzger, Chem. Mater. 10, 2470 (1998).
9. A. P. Li, F. Müller, A. Birner, K. Nielsch, and U. Gösele, J. Appl. Phys. 84, 6023 (1998).
10. H. Masuda, F. Hasegawa, and S. Ono, J. Electrochem. Soc. 144, LI27 (1997).
11. S. Shingubara, K. Morimoto, H. Sakaue, and T. Takahagi, Electrochem. Solid-State Lett. 7, El5 (2004).
12. S. K. Hwang, S. H. Jeong, H. Y. Hwang, O. J. Lee, and K. H. Lee, Korean J. Chem. Eng. 19, 467 (2002).
13. H. Masuda, H. Yamada, M. Satoh, H. Asoh, M. Nakao, and T. Tamamura, Appl. Phys. Lett. 71, 2770 (1997).
14. L. Ba and W. S. Li, J. Phys. D: Appl. Phys. 33, 2527 (2000).
15. G. D. Sulka, S. Stroobants, V. Moshchalkov, G. Borghs, and J. P. Celis, J. Electrochem. Soc. 149, D97 (2002).
16. N. V. Myung, J. Lim, J. P. Fleurial, M. Yun, W. West, and D. Choi, Nanotechnology 15, 833 (2004).