Characterization and field emission performance of electrochemically synthesized FeOOH nanowalls

Journal of Nanoscience and Nanotechnology

Volumn 7, Issue 9, 2007, Pages 3301-3306

  Chin, Kok Chung ^a   Cui, Huifang ^a   Sow, Chorng Haur ^a   Sheu, Fwu Shan ^a   Van, Li Hui ^a   Gao, Xingyu ^a   Wee, Andrew Thye Shen ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Electrochemical; Iron oxyhydroxide; Nanowall; Self assembly

Indexed keywords

DIRECT METHOD (DM); ELECTROCHEMICAL PROCESSING; ELECTROCHEMICAL TECHNIQUES; EMISSION CURRENT DENSITY; EMISSION PERFORMANCE; EX SITU; IRON (III); NANOWALLS; POTENTIOSTATIC; PULSE CYCLING; ROOM-TEMPERATURE (RT); SYNTHESIS (OF CHIRAL IONIC LIQUIDS); TURN-ON ELECTRIC FIELD;

ELECTRIC FIELDS; ELECTROMAGNETIC FIELD THEORY; ELECTROMAGNETIC FIELDS; ELECTROMAGNETISM; FIELD EMISSION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IRON; IRON COMPOUNDS; MAGNETISM;

CURRENT DENSITY;

FERRIC HYDROXIDE; FERRIC ION; NANOMATERIAL; NANOPARTICLE; NANOTUBE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; ELECTROCHEMISTRY; ELECTRODE; INFRARED SPECTROSCOPY; METHODOLOGY; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTY; TEMPERATURE; TIME; TRANSMISSION ELECTRON MICROSCOPY;

ELECTROCHEMISTRY; ELECTRODES; FERRIC COMPOUNDS; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; MODELS, CHEMICAL; NANOPARTICLES; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES; SPECTROSCOPY, FOURIER TRANSFORM INFRARED; SURFACE PROPERTIES; TEMPERATURE; TIME FACTORS;

EID: 38449094857     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2007.870     Document Type: Article

References (34)

1. K. Matsui, T. Kyotani, and A. Tomita, Mol. Cryst. Liq. Cryst. 387, 225 (2002).
2. H. C. Choi, S. Kundaria, D. W. Wang, A. Javey, Q. Wang, M. Rolandi, and H. J. Dai, Nano Lett. 3, 157 (2003).
3. C. J. Jia, L. D. Sun, Z. G. Yan, L. P. You, F. Luo, X. D. Han, Y. C. Pang, Z. Zhang, and C. H. Yan, Angew. Chem. Int. Edit. 44, 4328 (2005).
4. X. L. Li, J. F. Liu, and Y. D. Li, Mater. Chem. Phys. 80, 222 (2003).
5. T. Sugimoto, K. Sakata, and A. Muramatsu, J. Colloid Interface Sci. 159, 372 (1993).
6. M. Niederberger, F. Krumeich, K. Hegetschweiler, and R. Nesper, Chem. Mater. 14, 78 (2002).
7. Y. Li, H. Liao, and Y. Qian, Mater. Res. Bull. 33, 841 (1998).
8. C. Pascal, J. L. Pascal, F. Favier, M. L. E. Moubtassim, and C. Payen, Chem. Mater. 11, 141 (1999).
9. Y. C. Liu and S. J. Yang, Electrochim. Acta 50, 3674 (2005).
10. J. Kim, M. Noh, J. Cho, H. Kim, and K. B. Kim, J. Electrochem. Soc. 152, A1142 (2005).
11. K. Borgohain, N. Murase, and S. Mahamuni, J. Appl. Phys. 92, 1292 (2002).
12. S. Peulon, H. Antony, L. Legrand, and A. Chausse, Electrochim. Acta 49, 2891 (2004).
13. M. Schneider and M. Stratmann, Ber. Bunsenges. Phys. Chem. 96, 1731 (1992).
14. K. W. Chung, K. B Kim, S. H. Han, and H. Lee, J. Electrochem. Soc. 152, C560 (2005).
15. D. C. Silverman, Corrosion 38, 453 (1982).
16. Joint Committee on Powder Diffraction Standards. Diffraction Data File, No: 22-0353, International Center for Diffraction Data.
17. L. Legrand, G. Sagon, S. Lecomte, A. Chausse, and R. Messina, Corros. Sci. A3, 1739 (2001).
18. X. J. Yu, O. Wilhelmi, H. O. Moser, S. V. Vidyaraj, X. Y. Gao, A. T. S. Wee, T. Nyunt, H. J. Qian, and H. W. Zheng, J. Electron Spectrosc. Relat. Phenom. 144, 1031 (2005).
19. W. S. Epling, G. B. Hoflund, J. F. Weaver, S. Tsubota, and M. Haruta, J. Phys. Chem. 100, 9929 (1996).
20. S. Sunohara, K. Nishimura, K. Yahikozawa, M. Ueno, M. Enyo, and Y. Takasu, J. Electroanal. Chem. 354, 161 (1993).
21. M. Kosmulski, S. Durand-Vidal, E. Maczka, and J. B. Rosenholm, J. Colloid Interfac. Sci. 271, 261 (2004).
22. M. Kosmulski, E. Maczka, E. Jartych, and J. B. Rosenholm, Adv. Colloid Interfac. Sci. 103, 57 (2003).
23. T. Hiemstra, J. C. M. de Wit, and W. H. van Riemsdijk, J. Colloid Interface Sci. 133, 105 (1989).
24. A. Gohel, K. C. Chin, Y. W. Zhu, C. H. Sow, and A. T. S. Wee, Carbon 43, 2530 (2005).
25. R. C. Wang, C. P. Liu, J. L. Huang, S. J. Chen, Y. K. Tseng, and S. C. Kung, Appl. Phys. Lett. 87, 013110 (2005).
26. Q. Wan, K. Yu, T. H. Wang, and C. L. Lin, Appl. Phys. Lett. 83, 2253 (2003).
27. H. H. Lin, C. Y. Wang, H. C. Shih, J. M. Chen, and C. T. Hsieh, J. Appl. Phys. 95, 5889 (2004).
28. J. H. Zhan, Y. Bando, J. Q. Hu, Y. B. Li, and D. Golberg, Chem. Mater. 16, 5158 (2004).
29. T. Yu, Y. W. Zhu, X. J. Xu, Z. X. Shen, P. Chen, C.-T Lim, J. T.-L. Thong, and C. H. Sow, Adv. Mater. 17, 1595 (2005).
30. B. Xiang, Y. Zhang, Z. Wang, X. H. Luo, Y. W. Zhu, H. Z. Zhang, and D. P. Yu, J. Phys. D Appl. Phys. 38, 1152 (2005).
31. N. Saurakhiya, Y. W. Zhu, F. C. Cheong, C. K. Ong, A. T. S. Wee, J. Y. Lin, and C. H. Sow, Carbon 43, 2128 (2005).
32. G. Guan, T. Kida, T. Ma, K. Kimura, E. Abe, and A. Yoshida, Green Chem. 5, 630 (2003).
33. C. J. Lee, T. J. Lee, S. C. Lyu, Y. Zhang, H. Ruh, and H. J. Lee, Appl. Phys. Lett. 81, 3648 (2002).
34. S. Hofmann, C. Ducati, B. Kleinsorge, and J. Robertson, Appl. Phys. Lett. 83, 4661 (2003).