New soft X-ray facility SINS for surface and nanoscale science at SSLS

Journal of Electron Spectroscopy and Related Phenomena

Volumn 144-147, Issue , 2005, Pages 1031-1034

  Yu, Xiaojiang ^a   Wilhelmi, Oliver ^a   Moser, Herbert O ^a   Vidyaraj, Singanallur V ^a   Gao, Xingyu ^a   Wee, Andrew T S ^a   Nyunt, Tun ^a   Qian, Haijie ^b   Zheng, Hongwei ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b INSTITUTE OF HIGH ENERGY PHYSICS   (China)

Author keywords

Beamline; Monochromator; Photoemission; SINS; XMCD

Indexed keywords

ATOMIC FORCE MICROSCOPY; LIGHT POLARIZATION; LOW ENERGY ELECTRON DIFFRACTION; MONOCHROMATORS; NANOSTRUCTURED MATERIALS; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; SCANNING TUNNELING MICROSCOPY; X RAY LITHOGRAPHY; X RAYS;

NANOSCALE SCIENCE; SINGAPORE SYNCHROTRON LIGHT SOURCE (SSLS); SINS; XMCD;

SYNCHROTRON RADIATION;

EID: 17444408167     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.01.256     Document Type: Conference Paper

References (8)

1. C.T. Chen Rev. Sci. Instrum. 63 1992 1229
2. P. Kirkpatrick, and A.V. Baez J. Opt. Soc. Am. 38 1948 766
3. B.T. Thole, P. Carra, F. Sette, and G. van der Laan Phys. Rev. Lett. 68 1992 1943
4. P. Carra, B.T. Thole, M. Altarelli, and X. Wang Phys. Rev. Lett. 70 1993 694
5. N. Rana, S. Sodhi, and C.E. Brion J. Electron Spectrosc. Relat. Phenom. 34 1984 363
6. M. Domke, T. Mandel, A. Puschman, C. Xue, D.A. Shirley, and G. Kaindl Rev. Sci. Instrum. 63 1992 80
7. S. Aksela, A. Kivimaki, A. Naves de Brito, O.-P. Sairanen, S. Svensson, and J. Vayrynen Rev. Sci. Instrum. 65 1994 831
8. C.T. Chen, F. Sette, Y. Ma, and S. Modesti Phys. Rev. B 42 1990 7262