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Journal of Materials Science: Materials in Electronics

Volumn 15, Issue 9, 2004, Pages 629-633

Microstructural characteristics and carbon content of Al2O3 films as a function of deposition parameters

(4) Guzman Mendoza J a Garcia Hipolito, M a Aguilar Frutis, M b Falcony, C c

a INSTITUTO DE INVESTIGACIONES EN MATERIALES (Mexico)

b INSTITUTO POLITÉCNICO NACIONAL (Mexico)

c DEPARTAMENTO DE FÍSICA (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CARBON; DEPOSITION; ETCHING; HEAT TREATMENT; MICROSTRUCTURE; PYROLYSIS; SILICON; SPRAYING; STOICHIOMETRY; SURFACE ROUGHNESS; THIN FILMS;

ALUMINUM ACETYLACETONATE; CARBON CONTENT; DEPOSITION RATES; DIMETHYLFORMAMIDE; MOLAR CONCENTRATION; SILICON SUBSTRATES; SPRAYING SOLUTION;

ALUMINA;

EID: 3843114482 PISSN: 09574522 EISSN: None Source Type: Journal
DOI: 10.1023/B:JMSE.0000036044.89147.8d Document Type: Article

Times cited : (9)

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