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Volumn 5377, Issue PART 2, 2004, Pages 1297-1304

Diffraction analysis of customized illumination technique

Author keywords

Customized illumination; Diffraction domain analysis; Illumination optimization

Indexed keywords

ABERRATIONS; DYNAMIC RANDOM ACCESS STORAGE; FOURIER TRANSFORMS; LITHOGRAPHY; PHASE MODULATION; SPECTRUM ANALYSIS;

EID: 3843103531     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.536357     Document Type: Conference Paper
Times cited : (5)

References (4)
  • 1
    • 0032634699 scopus 로고    scopus 로고
    • Customized off-axis illumination aperture filtering for sub-0.18 μm KrF lithography
    • Chin C. Hsia, et. al. "Customized off-axis illumination aperture filtering for sub-0.18 μm KrF lithography" Proc. SPIE vol.3678, pp427-434, 1999
    • (1999) Proc. SPIE , vol.3678 , pp. 427-434
    • Hsia, C.C.1
  • 3
    • 0141610108 scopus 로고    scopus 로고
    • Process latitude extension in low k1 DRAM lithography using specific layer oriented illumination design
    • Y. Kang et. al. "Process latitude extension in low k1 DRAM lithography using specific layer oriented illumination design" proc. SPIE vol 5040, pp1304-1309, 2003
    • (2003) Proc. SPIE , vol.5040 , pp. 1304-1309
    • Kang, Y.1
  • 4
    • 0141610767 scopus 로고    scopus 로고
    • Layer specific illumination optimization by Monte Carlo method
    • H. Kim et.al. "layer specific illumination optimization by Monte Carlo method" proc. SPIE vol.5040, pp244-250, 2003
    • (2003) Proc. SPIE , vol.5040 , pp. 244-250
    • Kim, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.