Comparative study of inductively coupled and microwave BF3 plasmas for microelectronic technology applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5401, Issue , 2004, Pages 55-63

  Sukhanov, Yakov N ^a   Ershov, Alexey P ^b   Rudenko, Konstantin V ^a   Orlikovsky, Alexander A ^a  

^a RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

Boron trifluoride; Inductively coupled plasma; Langmuir probe diagnostics; Microwave plasma

Indexed keywords

DIFFUSION; DISSOCIATION; ELECTRIC EXCITATION; HEATING; INDUCTIVELY COUPLED PLASMA; IONIZATION; MAGNETIC FIELDS; MAGNETIC FLUX; MICROWAVES; PERMANENT MAGNETS; PLASMA CONFINEMENT; PLASMAS;

BORON TRIFLUORIDE; HIGH-DENSITY PLASMA (HDP); LANGMUIR PROBE DIAGOSTICS; MICROWAVE PLASMA;

MICROELECTRONICS;

EID: 3843085044     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.556998     Document Type: Conference Paper

References (25)

1. J. Hopwood, T.D. Mantei, "Application-driven development of plasma source technology", J. Vac. Sci. Technol. A, 21, No. 5, 139-144, 2003.
2. A.A. Orlikovsky, K.V. Rudenko, Ya.N. Sukhanov, "In situ Diagnostics of Plasma Processes in Microelectronics: The Current Status and Immediate Prospects, Part IV.", Russian Microelectronics, 30, N. 6, 343-370, 2001.
3. P. Loewenhardt, W. Zawalski, Y. Ye, A. Zhao, T.R. Webb, D. Tajima, D.X. Ma, "Plasma Diagnostics: Use and Justification in an Industrial Environment", Jpn. J. Appl. Phys., 38, p. 4362-4366, 1999.
4. S.N. Averkin, A.P. Ershov, A.A. Orlikovsky, K.V. Rudenko, Ya.N. Sukhanov "Langmuir probe diagnostics of plasma created by RF and UHF sources in immersion ion implanter", Proceedings of XXX Zvenigorod Conference on Plasma Physics and Controlled Nuclear Fusion, Zvenigorod, 2003 (in Russian).
5. A.A. Orlikovsky, "Plasma processes in micro- and nanoelectronics. Part 2: new-generation plasma chemical reactors in microelectronics", Russian microelectronic, 28, No. 6, 355-364, 1999.
6. Handbook of plasma immersion ion implantation, Ed. by A. Andersen, J.Willey&Sons, New York, 2000.
7. S.N. Averkin, K.A. Valiev, V.V. Koshkin, A.A. Orlikovsky, K.V. Rudenko, and Ya.N. Sukhanov, "Microwave wide aperture high density plasma source", Russian Microelectronics, 28, N.6, 365-370, 1999.
8. 3 plasma parameters in plasma immersion ion implanter", Proceedings of the Third International Symposium on Theoretical and Applied Plasma Chemistry, 2, 426-428, Plyos, 2002, (in Russian).
9. S.N. Averkin, A.P. Ershov, A.A. Orlikovsky, K.V. Rudenko, Ya.N. Sukhanov, Russian Microelectronics, 32, N.5, 2003, (to be published).
10. H. Sugai, I. Ghanashev, M. Hosokava, K. Mizuno, K. Nakamura, H. Toyoda, K. Yamauchi, "Electron energy distribution functions and the influence on fluorocarbon plasma chemistry", Plasma Sources Sci. Technol., 10, 378-385, 2001.
11. M.A. Lieberman, A.J. Lichtenberg, Principles of plasma discharges and materials processing, John Wiley & Sons Inc., New York, 1994.
12. J. Hopwood, C.R. Guarnieri, S.J. Whitehair, J.J. Cuomo, "Langmuir probe measurements of a radio frequency induction plasma", J. Vac. Sci. Technol. A, 11, 152-156, 1993.
13. Yu.A. Ivanov, Yu.A. Lebedev, L.S. Polak, Methods of invasive diagnostics in non-equilibrium plasma chemistry, Nauka, Moscow, 1981 (in Russian).
14. V.A. Godyak, R.B. Piejak, B.M. Alexandrovich, "Measurements of electron energy distribution in low-pressure RF discharges", Plasma Sources Sci. Technol., 1, 36-58, 1992.
15. A.P. Ershov, V.A. Dovzhenko, A.A. Kuzovnikov, S.N. Oks. "About the treatment of Langmuir probe I-V characteristics in non-maxwellian plasma", Plasma Physics,. B7, N3, p. 609, 1981 (in Russian).
16. T. Lagarde, Y. Arnal, A. Lacoste, J. Pelletier, "Determination of the EEDF by Langmuir probe diagnostics in a plasma excited at ECR above a multipolar magnetic field", Plasma Sources Sci. Technol., 10, 181-190, 2001.
17. A.P. Ershov, G.S. Solntzev, Interaction of electromagnetic waves with plasmas and UHF discharges, MSU Publishing House, Moscow, 1990 (in Russian).
18. H. Amemiya, B.M. Annaratone, J.E. Allen, "The collection of positive ions by spherical and cylindrical probes in an electronegative plasma", Plasma sources Sci. Technol., 8, 179-190, 1999.
19. A.P. Ershov, A.A. Kuzovnikov, B.N. Krasheninnikov, "Determination of charged particles concentration from the ion current on cylindrical probe in weak ionized low pressure plasma.", Bulletin of MSU. Physics and Astronomy, 25, N. 1, 23-26, 1984, (in Russian).
20. B.M. Annaratone, M.W. Allen and J.E. Allen, "Ion currents to cylindrical Langmuir probes in RF plasmas", J. Phys. D: Appl. Phys., 25, 417-424, 1992.
21. P. Bryant, A. Dyson, J.E. Allen, "Langmuir probe measurements of weakly collisional electronegative RF discharge plasmas", J. Phys. D: Appl. Phys., 34, 95-104, 2001.
22. Akihiro Kono, "Negative ions in processing plasmas and their effect on the plasma structure", Applied Surface Science, 192, 115-134, 2002.
23. 3Br/Ar discharge in diode plasma-chemical reactor", IPTRAS Proceedings, 6, 17-34, 1993, (in Russian).
24. V.A. Godyak, R.B. Piejak, V.M. Alexandrovich, "Electron energy distribution function measurements and plasma parameters in inductively coupled argon plasma", Plasma sources Sci. Technol., 11, 525-543, 2002.
25. M.V. Malyshev, V.M. Donnelly, "Trace rare gases optical emission spectroscopy: Noninvasive method for measuring electron temperatures in low-pressure, low-temperature plasmas", Phys. Rew. E, 60, N.5, 6016-6029, 1999.