Ablation and blow-off characteristics at 248 nm of Al, Sn and Ti targets used for thin film pulsed laser deposition

Journal of Applied Physics

Volumn 80, Issue 3, 1996, Pages 1794-1802

  Timm, R ^a   Willmott, P R ^a   Huber, J R ^a  

^a UNIVERSITY OF ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000978708     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362990     Document Type: Article

References (41)

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