Application of newly synthesized poly(hydroxystyrene-acrylate) copolymers to improve vacuum stability on E-beam resist for mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 565-574

  Lee, Dong Hwal ^a   Kim, Sang Jung ^a   Choi, Dong Uk ^a   Kim, Deogbae ^a   Kim, Jae Hyun ^a   Kim, Chang Hwan ^b  

^a Dongjin Semichem Co Ltd   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Acetal polymer; Boiling point; Chemical amplified resist; Electron beam resist; Sensitivity; Vacuum stability

Indexed keywords

ACETAL RESINS; COPOLYMERS; ELECTRON BEAMS; MASKS; SYNTHESIS (CHEMICAL); VACUUM APPLICATIONS;

ACETAL POLYMERS; CHEMICAL AMPLIFIED RESISTS; ELECTRON BEAM RESISTS; VACUUM STABILITY;

ORGANIC POLYMERS;

EID: 3843056733     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534999     Document Type: Conference Paper

References (5)

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