Coated conductor: Some critical aspects from substrate to device

Materials Science Forum

Volumn 546-549, Issue PART 4, 2007, Pages 1855-1864

  Odier, P ^a   Girard, A ^a,b   Cointe, Y ^a   Donet, S ^c,f   Yu, Z ^a,d   Caroff, T ^a,c   Cavallaro, A ^c   Guibadj, A ^a,e  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b LAIMAN   (France)

^c GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^d NORTHWEST INSTITUTE FOR NONFERROUS METAL RESEARCH   (China)

^e UNIVERSITY OF LAGHOUAT   (Algeria)

^f CEA GRENOBLE   (France)

Author keywords

Buffer layers; Chemical solution deposition; Coated conductors; Fault current limiters; MOCVD

Indexed keywords

EID: 38349129582     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-432-4.1855     Document Type: Conference Paper

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