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Volumn 51, Issue 6, 2007, Pages 685-714

IBM POWER6 microprocessor physical design and design methodology

Author keywords

[No Author keywords available]

Indexed keywords

INFORMATION MANAGEMENT; SOFTWARE DESIGN; TRANSISTORS;

EID: 37549056552     PISSN: 00188646     EISSN: 00188646     Source Type: Journal    
DOI: 10.1147/rd.516.0685     Document Type: Article
Times cited : (26)

References (2)
  • 1
    • 33745148992 scopus 로고    scopus 로고
    • High Performance 65 nm SOI Technology with Dual Stress Liner and Low Capacitance SRAM Cell
    • Digest of Technical Papers, June 14-16
    • E. Leobandung, E. Nayakama, H. Mocuta, D. Miyamoto, K. Angyal, M. Meer, H. V. McStay, et al., "High Performance 65 nm SOI Technology with Dual Stress Liner and Low Capacitance SRAM Cell," 2005 Symposium on VLSI Technology, Digest of Technical Papers, June 14-16, 2005, pp. 126-127.
    • (2005) Symposium on VLSI Technology , vol.2005 , pp. 126-127
    • Leobandung, E.1    Nayakama, E.2    Mocuta, H.3    Miyamoto, D.4    Angyal, K.5    Meer, M.6    McStay, H.V.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.