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Volumn 20, Issue 4, 2007, Pages 599-603

Applications for photoacid generation in photoimaging and nanotechnology

Author keywords

Diaryliodonium salts; Onium salts; Photacid generation; Photopolymerization; Triarylsulfonium salts

Indexed keywords


EID: 37549029685     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.599     Document Type: Article
Times cited : (6)

References (24)
  • 1
    • 0002753621 scopus 로고
    • Introduction to Microlithography
    • L.F. Thompson, C.G. Willson and M.J. Bowden, editors, Am. Chem. Soc, Washington, D.C
    • Introduction to Microlithography L.F. Thompson, C.G. Willson and M.J. Bowden, editors, ACS Symposium Ser. 219, Am. Chem. Soc., Washington, D.C. (1983) p. 88
    • (1983) ACS Symposium Ser , vol.219 , pp. 88
  • 6
    • 0038333190 scopus 로고
    • Pappas, S.P, editor, Technology Marketing Corp, Stamford, Conn, Chapter 2
    • J.V. Crivello UV Curing Science and Technology; Pappas, S.P., editor, Technology Marketing Corp., Stamford, Conn., Chapter 2, (1978) p. 53.
    • (1978) UV Curing Science and Technology , pp. 53
    • Crivello, J.V.1
  • 16
    • 37549032858 scopus 로고    scopus 로고
    • D.A. Waldman, R.T. Ingwall, P.K. Dal, M.G. Horner, E.S. Kolb, H.-Y. Li, R.A. Mins and H.G. Shild Proc. SPIE (1996) 2689 (Difrractive and Holographic Optics Techn. II) 127.
    • D.A. Waldman, R.T. Ingwall, P.K. Dal, M.G. Horner, E.S. Kolb, H.-Y. Li, R.A. Mins and H.G. Shild Proc. SPIE (1996) 2689 (Difrractive and Holographic Optics Techn. II) 127.
  • 17
    • 0013387991 scopus 로고
    • C.E. Hoyle and J.F. Kinstle, editors
    • J.V. Crivello and J.L. Lee ACS Symp. Ser. No. 417, C.E. Hoyle and J.F. Kinstle, editors 1989, p. 398.
    • (1989) ACS Symp. Ser , vol.417 , pp. 398
    • Crivello, J.V.1    Lee, J.L.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.